Fabrication of Mesoporous Titanium Dioxide Assisted by Resorcinol/Formaldehyde Gel


Mananya Thovicha(1), Varong Pavarajarn(2*)

(1) Center of Excellence in Particle Technology, Faculty of Engineering, Chulalongkorn University, Bangkok, 10330, THAILAND
(2) Center of Excellence in Particle Technology, Faculty of Engineering, Chulalongkorn University, Bangkok, 10330, THAILAND
(*) Corresponding Author


Mesoporous structures of materials have attracted considerable attention recently because of their potential in a variety of applications. In this work, resorcinol/formaldehyde (RF) gel was used as a template for the synthesis of mesoporous titania, which is in great interest in catalysis, photocatalysis, gas sensor and photovoltaic applications. RF-gel was prepared by the sol-gel polycondensation of resorcinol (R) and formaldehyde (F). Titanium tetraisopropoxide (TTIP) was used as precursor for titania. However, direct incorporation of TTIP into RF-gel was limited by a spontaneous reaction between TTIP and RF gel, which consequently resulted in rapid solidification of the gel. Titania sol was firstly prepared from TTIP via sol-gel process. After certain period of aging time, the titania sol was added into RF mixture, which had been aged for predetermined period of time as well. After that, the mixture was further aged for another 36 hours before being dried at 80°C. Finally, the dried gel was calcined at 500°C for 4 hours to remove the RF template. The obtained titania powders were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), surface area measurement via nitrogen adsorption, and Fourier transform infrared spectroscopy (FTIR). The specific surface area of the samples was in the range of 30-33 m2/g. and the average diameter of about 8.8-37.7 nm. It was found that the rate of addition for titania sol into the RF-gel had influence on the phase of the final product. The increased rate favored the formation of titania in rutile phase.


Mesoporous, Titania, Resorcinol/formaldehyde gel

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  1. W. Zhang, H. Wang and Z. Jin: Materials Letters 59 (2005) 250.
  2. C. Wang, Z.-X. Deng and Y. Li: Inorganic Chemistry 40 (2001) 5210.
  3. S. Mahshid, M. Askari and M.S. Ghamsari: Journal of Materials Processing Technology 189 (2007) 296.
  4. M. Miyauchi, A. Nakajima, A. Fujishima, K. Hashimoto and T. Watanabe: Chemistry of Materials 12 (1999) 3.
  5. S.K. Hazra, S.R. Tripathy, I. Alessandri, L.E. Depero and S. Basu: Materials Science and Engineering: B 131 (2006) 135.
  6. C.-S. Kim, B.K. Moon, J.-H. Park, B.-C. Choi and H.-J. Seo: Journal of Crystal Growth 257 (2003) 309.
  7. A.M. Ruiz, G. Sakai, A. Cornet, K. Shimanoe, J.R. Morante and N. Yamazoe: Sensors and Actuators B: Chemical 103 (2004) 312.
  8. D.H. Kim, H.S. Hong, S.J. Kim, J.S. Song and K.S. Lee: Journal of Alloys and Compounds 375 (2004) 259.
  9. S.-M. Oh and T. Ishigaki: Thin Solid Films 457 (2004) 186.
  10. T.Y. Masakazu Matsubara, Hisayoshi Itoh, Hiroaki Abe and Keisuke Asai: Jpn. J.Appl. Phys 42 (2003) L479.
  11. B. Babic, B. Kalu๐erovic, L. Vracar and N. Krstajic: Carbon 42 (2004) 2617.
  12. M. Burgos and M. Langlet: Thin Solid Films 349 (1999) 19.
  13. I. Poljansek and M. Krajnc: Scientific paper 52 (2005) 238.
  14. W.L. Guo, Z.M. Lin, X.K. Wang and G.Z. Song: Microelectronic Engineering 66 (2003) 95.

DOI: https://doi.org/10.22146/ajche.50041

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ASEAN Journal of Chemical Engineering  (print ISSN 1655-4418; online ISSN 2655-5409) is published by Chemical Engineering Department, Faculty of Engineering, Universitas Gadjah Mada.